Intel Foundry and ASML detail progress toward High NA EUV readiness
At the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference, Intel Foundry and ASML said they are making continued progress toward bringing High Numerical Aperture High NA EUV lithography into production.
This week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference, Intel Foundry and ASML said they continued to make progress on bringing High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography into production and on developing the technologies that will shape its future.